And aparat0 method for multivariate analysis of failures to increase yields of semiconductor manufacturing.

摘要

Method and apparatus for analyzing multivariate failure to increase the performance of semiconductor manufacturing.; Method and apparatus for analyzing multivariate failure to increase the performance of semiconductor manufacturing, comprising means for forming a plurality of wafers each comprising a plurality of "dice"; collect data corresponding electrical characteristics in the plurality of devices 'given' data collecting performance characteristics of circuits of the plurality of "dice", corresponding to a chosen circuit performance characteristic; compare data collected from operation of the circuits with a threshold to determine faults; an analysis of multivariate failure based on data collected from the electrical characteristics; and adjusting at least one process of manufacturing semiconductors based on multivariate analysis of failures to reduce failures.