首页> 外国专利> DISCHARGE SOURCE WITH GAS CURTAIN FOR PROTECTING OPTICS FROM PARTICLES

DISCHARGE SOURCE WITH GAS CURTAIN FOR PROTECTING OPTICS FROM PARTICLES

机译:气体幕帘的放电源,用于保护颗粒中的光学元件

摘要

A gas curtain device is employed to deflect debris that is generated by an extreme ultraviolet and soft x-ray radiation discharge source such as an electric discharge plasma source. The gas curtain device projects a stream of gas over the path of the radiation to deflect debris particles into a direction that is different from that of the path of the radiation. The gas curtain can be employed to prevent debris accumulation on the optics used in photolithography.
机译:使用气幕装置来偏转由极紫外和软X射线辐射放电源(例如放电等离子体源)产生的碎屑。气幕装置将气体流投射在辐射的路径上,以将碎屑颗粒偏转到与辐射的路径不同的方向。可以使用气幕来防止碎屑堆积在光刻中使用的光学器件上。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号