Effective dry etching modulo null below-mentioned process of actinide oxide and its mixed oxide in

摘要

(57) Abstract Topic The below-mentioned process is included, vapor phase etching method of the actinide oxide from the baseplate by plasma output; a) the actinide oxide on the baseplate inside the process chamber where the fluorine content gas is filled up is extra heated, this is disclosed to plasma output, actinide oxide is etched from the baseplate b) making use of plasma gas phase reaction field system next.