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Effective dry etching process of actinide oxides and their mixed oxides in CF4/O2/N2 plasma
Effective dry etching process of actinide oxides and their mixed oxides in CF4/O2/N2 plasma
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机译:CF4 / O2 / N2等离子体中act系氧化物及其混合氧化物的有效干法蚀刻工艺
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摘要
A process for gas-phase etching of actinide oxides from a substrate by using plasma power comprising the steps of: a) preheating actinide oxides on the substrate within a process chamber filled with fluorine-containing gas and exposing it to plasma power, and subsequently b) etching actinide oxides from the substrate using a plasma gas-phase reactant system.
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