首页> 外国专利> FET comprises a source, a drain, and a canal region located in a substrate, and a barrier layer which separates the source and/or drain regions from the canal region

FET comprises a source, a drain, and a canal region located in a substrate, and a barrier layer which separates the source and/or drain regions from the canal region

机译:FET包括位于衬底中的源极,漏极和沟道区,以及将源极和/或漏极区与沟道区分开的阻挡层。

摘要

A FET comprises a source (42a), a drain (42b) and a canal region (46) in a substrate (10). The source and/or drain regions are separated from the canal region by a barrier layer (40). The latter consists of a nitride or oxide layer.
机译:FET包括衬底(10)中的源极(42a),漏极(42b)和沟道区(46)。源极区和/或漏极区通过阻挡层(40)与沟道区分开。后者由氮化物或氧化物层组成。

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