Preparation of a lithographic mask on a curved surface, for use in microtechnology and nanotechnology for the fabrication of flat screens, memories, nanosystems, microsystems or biochips

摘要

The preparation of a lithographic mask comprises: (a) the production of motifs (10) on a flat mask (12); and (b) posting the motifs on a support having a none zero curvature on at least one point of its surface. An independent claim is also included for the lithographic mask produced by the method.