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High light efficiency of GaN-series of light emitting diode and its manufacturing method thereof

机译:GaN系列发光二极管的高光效率及其制造方法

摘要

A high light efficiency of GaN-series of light emitting diode and its manufacturing method thereof disclose a process and structure of a p-type semiconductor layer of surface texture structure generation. The optical waveguide effect can be interrupted and the possibility of hexagonal shaped pits defect generated can be reduced through said texture structure. The method explores that controlling the tension and compression of strain while a p-type cladding layer and a p-type transition layer are generated, and then a p-type ohmic contact is formed on said p-type transition layer. Through the control and its structure of said epitaxial growth process, the surface of said p-type semiconductor layer is with texture structure to increase external quantum efficiency and its operation life.
机译:GaN系列发光二极管的高光效率及其制造方法公开了表面纹理结构产生的p型半导体层的工艺和结构。通过所述纹理结构,可以中断光波导效应,并且可以减少产生六边形凹坑缺陷的可能性。该方法探索了在产生p型覆层和p型过渡层的同时控制应变的拉伸和压缩,然后在所述p型过渡层上形成p型欧姆接触。通过控制所述外延生长过程及其结构,所述p型半导体层的表面具有纹理结构,以增加外部量子效率及其使用寿命。

著录项

  • 公开/公告号US2006097272A1

    专利类型

  • 公开/公告日2006-05-11

    原文格式PDF

  • 申请/专利权人 MU-JEN LAI;SCHANG-JING HON;

    申请/专利号US20050311275

  • 发明设计人 MU-JEN LAI;SCHANG-JING HON;

    申请日2005-12-20

  • 分类号H01L33;

  • 国家 US

  • 入库时间 2022-08-21 21:48:16

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