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Neutral beam injection device and ion beam process device for ion source and fusion reactor

机译:用于离子源和聚变反应堆的中性束注入装置和离子束处理装置

摘要

PROBLEM TO BE SOLVED: To surely prevent deflection of an ion beam extracted from a perfolated electrode. SOLUTION: When an ion beam is extracted by perfolated electrodes 5, 6, 7, a deflection angle of the ion bean in an electrode central part side is enlarged compared with the ion beam in an electrode end part side to generate deflection in respective outgoing directions of the ion beam. But, for the present invention, since centers of extraction holes from an extraction hole 9a in the end part side of each step to an extraction hole 9b in the central part side out of plural beam extraction holes 9 which are provided in the electrode 7 are shifted gradually uppersides from the hole 9a toward the hole 9b, the deflected ion beam is corrected to a parallel direction by passing the beam through the ion beam extraction holes 9 of the electrode 7. Both the ion beam in the electrode central side and the ion beam in the electrode end part side are brought into parallel, thereby the outgoing efficiency of the ion beam extracted finally from an ion source is enhanced and controlled properly.
机译:要解决的问题:为了确保防止从渗透电极引出的离子束发生偏转。解决方案:当离子束被穿孔的电极5、6、7引出时,与电极端部一侧的离子束相比,离子豆在电极中央部分侧的偏转角增大,从而在各个出射方向上产生偏转离子束。但是,在本发明中,从设置在电极7上的多个束引出孔9中,从各台阶的端部侧的引出孔9a到中心部侧的引出孔9b的引出孔的中心为从孔9a朝向孔9b逐渐向上侧偏移,使偏转的离子束穿过电极7的离子束引出孔9,从而将其校正为平行方向。通过使电极端部侧的电子束平行,最终提高从离子源引出的离子束的出射效率并进行适当的控制。

著录项

  • 公开/公告号JP3962965B2

    专利类型

  • 公开/公告日2007-08-22

    原文格式PDF

  • 申请/专利权人 株式会社日立製作所;

    申请/专利号JP19980130607

  • 发明设计人 田中 政信;

    申请日1998-05-13

  • 分类号H01J27/08;G21B1/11;H05H3/02;

  • 国家 JP

  • 入库时间 2022-08-21 21:10:21

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