首页> 外国专利> Semiconductor element and production process especially for an insulated gate bipolar transistor has very highly doped region between low and highly oppositely doped regions

Semiconductor element and production process especially for an insulated gate bipolar transistor has very highly doped region between low and highly oppositely doped regions

机译:半导体元件及其制造工艺,特别是用于绝缘栅双极晶体管的半导体元件和生产工艺,在低掺杂区域和高相反掺杂区域之间具有非常高的掺杂区域

摘要

A semiconductor element comprises a semiconductor body (1,6) with a strongly doped zone (4) between to metallized layers (5) and a second, weakly and oppositely doped zone (1) and a pn-junction. Between these two zones is a region (16) that is so highly doped that its concentration is higher than that of the charge carrier of the overflow charge in the transmitting condition of the semiconductor. An independent claim is also included for a production process for the above.
机译:半导体元件包括半导体本体(1,6),该半导体本体(1,6)具有在金属化层(5)之间的强掺杂区(4)和第二,弱且相反掺杂区(1)和pn结。在这两个区域之间是区域(16),其高度掺杂,以使其浓度高于在半导体的透射条件下的溢流电荷的电荷载流子的浓度。上述内容的生产过程也包括独立权利要求。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号