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METHOD FOR INSPECTING LOCAL VARIANCE IN MASK PATTERN, METHOD FOR ASSURING LOCAL VARIANCE, AND INSPECTION PROGRAM FOR LOCAL VARIANCE
METHOD FOR INSPECTING LOCAL VARIANCE IN MASK PATTERN, METHOD FOR ASSURING LOCAL VARIANCE, AND INSPECTION PROGRAM FOR LOCAL VARIANCE
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机译:遮罩图案中的局部变化的检查方法,局部变化的确定方法以及局部变化的检查程序
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摘要
PROBLEM TO BE SOLVED: To easily inspect local variance in a pattern of an exposure mask only by measuring diffracted light without using a microscope.;SOLUTION: The inspection method for local variance in a mask pattern is applied to a mask pattern which is formed on an exposure mask 20 and to be transferred onto a wafer by a projection exposure device, so as to inspect local variance of the pattern, and the method includes steps of: irradiating a regular pattern 21 formed on the mask 20 with light from a point light source 10 and monitoring the diffracted light with respect to the point light source 10; calculating the specification limit of the local variance by simulation with respect to the dimension and position of the regular pattern 21; calculating the diffracted light with respect to the point light source 10 on the mask 20 having the local variance corresponding to the specification limit; and comparing the monitored diffracted light and calculated diffracted light.;COPYRIGHT: (C)2008,JPO&INPIT
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