首页> 外国专利> HERMETIC PASSIVATION LAYER STRUCTURE FOR CAPACITOR WITH PEROVSKITE PHASE OR PYROCHLORE PHASE DIELECTRICS

HERMETIC PASSIVATION LAYER STRUCTURE FOR CAPACITOR WITH PEROVSKITE PHASE OR PYROCHLORE PHASE DIELECTRICS

机译:钙钛矿相或焦绿相介电常数的钝化钝化层结构

摘要

PROBLEM TO BE SOLVED: To provide a thin-film capacitor structure having a hermetic passivation layer structure including a hydrogen barrier or gettering layer, and its manufacturing method.;SOLUTION: The thin-film capacitor structure includes a substrate and a thin-film capacitor attached on the substrate which contains a pyrochlore or perovskite dielectric layer among many electrode layers. The electrode layer consists of a thin-film capacitor made of conductive thin-film materials, a pyrochlore or perovskite alkali earth titanate hydrogen-gettering barrier layer deposited on the thin-film capacitor and a silicon nitride layer deposited on the barrier layer, wherein the silicon nitride layer is deposited by plasma-enhanced chemical vapor deposition (PECVD) or low-pressure chemical vapor deposition (LPCVD).;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种具有包括氢阻挡层或吸杂层的气密钝化层结构的薄膜电容器结构及其制造方法。解决方案:薄膜电容器结构包括基板和薄膜电容器。附着在衬底上,该衬底在许多电极层之间包含烧绿石或钙钛矿介电层。电极层包括由导电薄膜材料制成的薄膜电容器,沉积在薄膜电容器上的烧绿石或钙钛矿碱土金属钛酸盐吸氢阻挡层和沉积在阻挡层上的氮化硅层,其中氮化硅层是通过等离子增强化学气相沉积(PECVD)或低压化学气相沉积(LPCVD)沉积的。;版权所有:(C)2008,JPO&INPIT

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