The high frequency power source which supplies high-frequency power to the electrode which is installed in the high frequency characteristic

摘要

PROBLEM TO BE SOLVED: To obtain a plasma processing apparatus which accurately measures high-frequency characteristics, especially of accurately measuring high-frequency characteristics during the generation of plasma.;SOLUTION: The plasma processing apparatus includes: a high-frequency power source, supplying high frequency electric power to electrodes arranged in a treatment chamber; a directional coupler inserted between transmission lines connecting the electrodes and the high-frequency power source so as to transmit the high-frequency electric power; a variable frequency generator that is connected to terminals combining terminals, which are connected to the electrodes of the directional coupler, and applies a high-frequency signal having a desired frequency to the electrodes; and a high-frequency characteristic detector that is connected to terminals combining terminals, which are connected to the electrodes of the directional coupler and measures the reflected waves, having high-frequency signals from the electrodes applied by the variable frequency generator.;COPYRIGHT: (C)2004,JPO&NCIPI