首页> 外国专利> A PROCESS FOR THE FABRICATION OF IMPROVED CONDUCTOR FOR POWER THICK FILM HYBRID MICROCIRCUITS /MICROWAVE INTEGRATED CIRCUITS(PHMC)

A PROCESS FOR THE FABRICATION OF IMPROVED CONDUCTOR FOR POWER THICK FILM HYBRID MICROCIRCUITS /MICROWAVE INTEGRATED CIRCUITS(PHMC)

机译:功率厚膜混合微电路/微波集成电路(PHMC)改进导体的制造工艺

摘要

A process for the fabrication of improved conductor for power thick film hybrid microcircuits/microwave integrated circuits by preparing known thick film conductors selected from Pd-Ag, Pt-Ag, Pd-Pt-Ag on thick film circuits by conventional methods; surface cleaning the thick film conductor paths obtained by known methods; shorting the conductor paths by known means; electroplating the conductors with copper in a standard conventional electroplating bath to grow a desired plating thickness of 4µm; removing shorting done from conductor paths; cleaning the resultant copper plated conductor paths on thick film substrate in distilled water.
机译:一种通过常规方法在厚膜电路上制备选自Pd-Ag,Pt-Ag,Pd-Pt-Ag的已知厚膜导体来制造功率厚膜混合微电路/微波集成电路改进导体的方法;表面清洁通过已知方法获得的厚膜导体路径;用已知方法使导体路径短路;在标准的常规电镀液中用铜对导体进行电镀,以使所需的电镀厚度达到4μm;消除导体路径上的短路;用蒸馏水清洁厚膜基材上的镀铜导体路径。

著录项

  • 公开/公告号IN228263B

    专利类型

  • 公开/公告日2008-09-26

    原文格式PDF

  • 申请/专利权人

    申请/专利号IN2449/DEL/1997

  • 发明设计人 YOGENDRA KUMAR JAIN;HARISH CHANDRA PANDEY;

    申请日1997-08-28

  • 分类号H01L21/82;

  • 国家 IN

  • 入库时间 2022-08-21 20:07:05

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