Standard wafer and standard critical dimension setting up method using the same

摘要

semiconductor wafer of the present invention is the measured line width to the line width of the reference line width of the measuring equipment to more precisely set the relates to a method based on the line width set to a standard wafer, and the wafer can be performed automatically with the standard. In ; The present invention, in two points both sides of the wafer of claim 1,2 OM alignment point 112, 114 is formed, wherein the 1,2 OM alignment point 112 114, and two points, respectively, and the other is on the horizontal line width measurement fields 122 and vertical line width measurement field 124 is formed, at a point in the horizontal line width measurement fields 122 and vertical line width measurement fields 124 Each claim 1 SEM alignment point section 132 and the second alignment point 2 SEM 134 provides a reference line width setting method characterized in that a standard wafer, and it is formed is aligned to the SEM.