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EXPOSURE DEVICE FOR NON PLANAR SUBSTRATE, PATTERNING METHOD FOR NON PLANAR SUBSTRATE USING THE DEVICE AND PATTERNED NON PLANAR SUBSTRATE USING THE METHOD THEREOF
EXPOSURE DEVICE FOR NON PLANAR SUBSTRATE, PATTERNING METHOD FOR NON PLANAR SUBSTRATE USING THE DEVICE AND PATTERNED NON PLANAR SUBSTRATE USING THE METHOD THEREOF
An exposure device for non-planar substrate, a non-planar substrate patterning method using the same, and a non-planar substrate patterned by the same method are provided to form a pattern on an entire surface of the non-planar substrate by rotating and exposing the non-planar substrate. A mask preparation process is performed to prepare a mask(100) having a non-planar substrate(300), a glass substrate(200), and a predetermined pattern(50). The mask is attached on a lower part of the glass substrate. A surface of the non-planar substrate is coated with photoresist(400). The non-planar substrate is arranged within a range without diffraction to the mask. The photoresist coated on the non-planar substrate is exposed by using a rotary exposure apparatus. The non-planar substrate is formed with a cylinder.
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