首页> 外国专利> INDIUM TIN OXIDE TARGET, METHOD FOR MANUFACTURING THE SAME, TRANSPARENT CONDUCTIVE FILM OF INDIUM TIN OXIDE, AND METHOD FOR MANUFACTURING TRANSPARENT CONDUCTIVE FILM OF INDIUM TIN OXIDE

INDIUM TIN OXIDE TARGET, METHOD FOR MANUFACTURING THE SAME, TRANSPARENT CONDUCTIVE FILM OF INDIUM TIN OXIDE, AND METHOD FOR MANUFACTURING TRANSPARENT CONDUCTIVE FILM OF INDIUM TIN OXIDE

机译:氧化铟锡靶,制造相同方法的透明氧化铟锡薄膜和制造透明导电薄膜的方法

摘要

Disclosed are an indium Tin Oxide (ITO) target, a method for manufacturing the same, a transparent conductive film of ITO, and a method for manufacturing the transparent conductive film of ITO. The ITO target includes at least one oxide selected from the group consisting of Sm2O3 and Yb2O3, wherein an amount of the oxide is about 0.5 wt. % to about 10 wt. % based on the weight of the target.
机译:公开了一种氧化铟锡(ITO)靶,其制造方法,ITO的透明导电膜以及ITO的透明导电膜的制造方法。 ITO靶包括选自Sm 2 O 3 和Yb 2 O 3

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