MANUFACTURING METHOD OF LOW-K THIN FILMS AND LOW-K THIN FILMS MANUFACTURED THEREFROM

摘要

The present invention relates to a method of manufacturing a low-k thin film and the low-k thin film manufactured therefrom. More specifically, the method of manufacturing a low-k thin film in accordance with an embodiment of the present invention includes subjecting thin film, which is formed by plasma polymerization, to post-heat treatment using an RTA device, and low-k thin film manufactured therefrom.;A method of manufacturing a low-k thin film in accordance with an embodiment of the present invention includes: evaporating a precursor solution including decamethylcyclopentasiloxane and cyclohexane in a bubbler; inflowing the evaporated precursor from the bubbler to a plasma deposition reactor; depositing a plasma-polymerized thin film on a substrate in the reactor by using a plasma in the reactor; and post-heat-treating by an RTA device.