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Power Semiconductor device having high breakdown voltage, low on-resistance and small switching loss

机译:具有高击穿电压,低导通电阻和小开关损耗的功率半导体器件

摘要

In accordance with one embodiment of the present invention, a power semiconductor device includes a first drift region of a first conductivity type extending over a semiconductor substrate. The first drift region has a lower impurity concentration than the semiconductor substrate. A second drift region of the first conductivity type extends over the first drift region, and has a higher impurity concentration than the first drift region. A plurality of stripe-shaped body regions of a second conductivity type are formed in an upper portion of the second drift region. A third region of the first conductivity type is formed in an upper portion of each body region so as to form a channel region in each body region between the third region and the second drift region. A gate electrode laterally extends over but is insulated from: (i) the channel region in each body region, (ii) a surface area of the second drift region between adjacent stripes of body regions, and (iii) a surface portion of each source region.
机译:根据本发明的一个实施例,功率半导体器件包括在半导体衬底上方延伸的第一导电类型的第一漂移区。第一漂移区具有比半导体衬底低的杂质浓度。第一导电类型的第二漂移区在第一漂移区上延伸,并且具有比第一漂移区更高的杂质浓度。在第二漂移区的上部形成第二导电类型的多个条形体区。在每个主体区域的上部中形成第一导电类型的第三区域,以便在第三区域和第二漂移区域之间的每个主体区域中形成沟道区域。栅电极横向延伸但与之隔离:(i)每个主体区域中的沟道区域;(ii)主体区域的相邻条带之间的第二漂移区域的表面区域;以及(iii)每个源极的表面部分地区。

著录项

  • 公开/公告号KR100873419B1

    专利类型

  • 公开/公告日2008-12-11

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20020034141

  • 发明设计人 최영철;김태훈;장호철;윤종만;

    申请日2002-06-18

  • 分类号H01L29/78;

  • 国家 KR

  • 入库时间 2022-08-21 19:14:21

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