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A method and semiconductor device with a protective layer for reducing the stress relaxation in a double bracing coating art
A method and semiconductor device with a protective layer for reducing the stress relaxation in a double bracing coating art
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机译:在双支撑涂层技术中具有减小应力松弛的保护层的方法和半导体器件
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摘要
By providing a protective layer for suppressing a bracing relaxation in a tensile-strained dielectric material during a dual bracing layer process, the performance of n - transistors can be improved, and wherein, nevertheless, a high degree of compatibility with conventional dual bracing layer projections is maintained.
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