HIGH ASPECT RATIO MICROSTRUCTURE AND METHOD OF FABRICATING THE SAME AND HIGH ASPECT RATIO MICROSTRUCTURE ARRAY AND METHOD OF FABRICATING THE SAME

摘要

A method for producing a high-aspect-ratio microstructure includes: a photomask attachment step of attaching a photomask with a pattern groove to one surface of a transparent substrate; a photoresist attachment step of attaching a negative photoresist to one surface of the photomask; an exposure step of irradiating light toward the opposite surface of the transparent substrate from the photomask to cure a portion of the negative photoresist with the light irradiated on the negative photoresist through the pattern groove; and a developing step of removing an uncured portion of the negative photoresist while leaving the cured portion of the negative photoresist as a microstructure. With this method, it is possible to produce the high-aspect-ratio microstructure in an easy and cost-effective manner.