High aspect ratio microstructure and method of fabricating the same and high aspect ratio microstructure array and method of fabricating the same

摘要

method of manufacturing a high aspect ratio microstructure of the present invention having the groove pattern on the surface of the transparent substrate, a photomask attachment step of attaching a photomask and a photoresist attachment step of attaching a negative photoresist to one surface of the photomask, a negative picture on the other side of the attachment portion of the transparent substrate is a photomask is irradiated with light through the pattern groove and curing the exposed portion of the negative photoresist with the light irradiated to the resist, to remove the unexposed portions of the negative photoresist is a negative photoresist is cured characterized in that it comprises a development step that reveals a microstructure made. According to the present invention, can be inexpensive and easy to prepare a fine structure by using a photolithography process.