首页> 外国专利> WAVEFORM COVERED YARN FORMED TO GOOD WAVEFORM PATTERN HAVING GOOD ESTHETIC SENSE AND MANUFACTURING METHOD THEREOF

WAVEFORM COVERED YARN FORMED TO GOOD WAVEFORM PATTERN HAVING GOOD ESTHETIC SENSE AND MANUFACTURING METHOD THEREOF

机译:具有良好审美感觉的,形成良好波形图案的波形覆盖纱及其制造方法

摘要

PURPOSE: Waveform covered yarns formed to a good waveform pattern and a manufacturing method thereof are provided to offer good decorative effects with superior esthetic sense.;CONSTITUTION: A manufacturing method of waveform covered yarns comprises the following steps of: bending covered yarns with an upper roller(13) and a lower roller(10); and twisting the yarns with holding yarns to maintain the patterns of the waveform. The holding yarns are supplied to twist the covered yarn with a spindle according to a transmitting direction of the yarns.;COPYRIGHT KIPO 2010
机译:目的:提供形成具有良好波形图案的波形包覆纱及其制造方法,以提供具有优良美学感的良好装饰效果。;构成:波形包覆纱的制造方法包括以下步骤:用粗纱弯曲包覆纱辊(13)和下辊(10);并用固定纱线加捻纱线以保持波形模式。提供保持纱线,以根据纱线的传输方向将纺好的包芯纱用锭子加捻。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20090117420A

    专利类型

  • 公开/公告日2009-11-12

    原文格式PDF

  • 申请/专利权人 KIM OK JAE;

    申请/专利号KR20080043460

  • 发明设计人 KIM OK JAE;

    申请日2008-05-09

  • 分类号D02G3/38;D02G3/34;

  • 国家 KR

  • 入库时间 2022-08-21 18:34:03

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