首页> 外国专利> FILM FORMING DEVICE, A METHOD FOR CLEANING THE SAME, AND A COMPUTER READABLE STORAGE MEDIUM, CAPABLE OF SUPPLYING CLEANING GAS TO THE UPPER SIDE OF A SUSCEPTOR BY INSTALLING A CLEANING NOZZLE ADJACENT TO THE UPPER SIDE OF THE SUSCEPTOR

FILM FORMING DEVICE, A METHOD FOR CLEANING THE SAME, AND A COMPUTER READABLE STORAGE MEDIUM, CAPABLE OF SUPPLYING CLEANING GAS TO THE UPPER SIDE OF A SUSCEPTOR BY INSTALLING A CLEANING NOZZLE ADJACENT TO THE UPPER SIDE OF THE SUSCEPTOR

机译:胶片形成装置,一种用于清洁同一装置的方法以及一种计算机可读存储介质,能够通过安装与支座上部相邻的清洁喷嘴向支座上部提供清洁气体

摘要

PURPOSE: A film forming device, a method for cleaning the same, and a computer readable storage medium are provided to remove a deposit on a susceptor without excessively exposing the inner side of the chamber to the cleaning gas.;CONSTITUTION: A susceptor(2) is pivotally installed inside a container(1). The substrate loading area is installed on one side of the susceptor and the substrate is loaded on the substrate loading area. A raw gas supply system supplies the raw gas on one side of the susceptor. A first concave unit partitions a reverse concave space by opening to one side of the susceptor upwardly. A second concave unit covers the first concave unit to partition a gas flow path between the first and second concave units. A cleaning gas supply unit supplies the cleaning gas to the reverse concave space. A cleaning structure(60) is connected to the gas flow path and includes an exhaust pipe(61) extended to the outside of the container. The exhaust pipe is formed on the container to exhaust the raw gas.;COPYRIGHT KIPO 2010
机译:目的:提供一种成膜装置,其清洁方法和计算机可读存储介质,以去除基座上的沉积物,而不会使腔室内部过度暴露于清洁气体中。;构成:基座(2 )可枢转地安装在容器(1)内。基板装载区域被安装在基座的一侧,并且基板被装载在基板装载区域上。原料气供应系统在基座的一侧上供应原料气。第一凹入单元通过向上向基座的一侧敞开来划分反向凹入空间。第二凹面单元覆盖第一凹面单元以在第一凹面单元和第二凹面单元之间划分气体流动路径。清洁气体供应单元将清洁气体供应到反向凹入空间。清洁结构(60)连接到气体流动路径并且包括延伸到容器的外部的排气管(61)。排气管形成在容器上以排出原料气。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20100056394A

    专利类型

  • 公开/公告日2010-05-27

    原文格式PDF

  • 申请/专利权人 TOKYO ELECTRON LIMITED;

    申请/专利号KR20090111181

  • 发明设计人 KATO HITOSHI;HONMA MANABU;

    申请日2009-11-18

  • 分类号H01L21/00;H01L21/205;

  • 国家 KR

  • 入库时间 2022-08-21 18:32:40

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