PHOTOLITHOGRAPHY ALIGNMENT MARK WHICH INCLUDES A REAL ROW AND A DUMMY ROW, CAPABLE OF SUPPLYING AN ALIGNMENT MARK WHICH IS USED IN A SCANNER

摘要

PURPOSE: A photolithography alignment mark is provided to generate exact alignment information when a part of an alignment mark is damaged during a chemical mechanical polishing process.;CONSTITUTION: A first row comprises a plurality of alignment patterns. A second row is located to be contiguous to the first row. The alignment patterns, which are included in the first row, are arranged with a first pitch in a row direction(R). The alignment patterns, which are included in the second row, are arranged with a second pitch which is different from the first pitch. The first row is a real row which provides alignment information to a photolithography device. The second row is a dummy row which does not provide the alignment information to the photolithography device.;COPYRIGHT KIPO 2011