3-dimensional micro-area elemental analysis method

摘要

PROBLEM TO BE SOLVED: To provide a method and a system for three-dimensional fine area elemental analysis which perform the elemental analysis in a condition controlled by layer, without applying high-voltage pulses required to cause electrical field evaporation on the sample, nor being affected by the difference in the electrical field evaporation of the component element.;SOLUTION: In the method, after a gas species 3, which is saturation adsorbed to an analysis sample 1 and allows etching to be proceeded through irradiation of an energy beam 5, is supplied to the analysis sample 1, the energy beam 5 is irradiated to desorb only the gas species 3 adsorbed portion of the analysis sample 1; and then mass spectrometry of particles 6 derived from the desorbed analytical sample 1 is performed to conduct elemental analysis of the surface on the analysis sample 1.;COPYRIGHT: (C)2006,JPO&NCIPI