Ethylenically unsaturated group-containing maleimide resin and a manufacturing method thereof, and the photocurable composition and the light-heat-curable composition containing an ethylenically unsaturated group-containing maleimide resin

摘要

PROBLEM TO BE SOLVED: To provide a new maleimide-based resin which forms patterns by photolithography and has an excellent heat resistance.;SOLUTION: The maleimide-based resin containing ethylenic unsaturated groups is obtained by reacting phenolic hydroxyl groups in a maleimide-based resin containing a structure expressed by formula (1), epoxy groups in an ethylenic unsaturated compound containing epoxy groups and/or an unsaturated compound containing isocyanate groups.;COPYRIGHT: (C)2007,JPO&INPIT