Photolithography of a Photocrosslinkable Copolymer Prepared from a 2-Styrylpyridine Group-Containing Maleimide and N-Dodecyl Maleimide

摘要

Photolithographic patterning technology has made significant contributions to the microelectronics industry. Photolithography is generally based on photocrosslinking reactions of polymeric photoresists. Resist materials need to have not only high transparency in a visible region but also high resolution in order to be used as display device materials.