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Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask
Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask
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机译:使用莱文森型掩模的图案形成方法和制造莱文森型掩模的方法
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摘要
A method of forming a pattern including a first pattern portion having a first minimum dimension and a second pattern portion having a second minimum dimension includes a first exposure step of performing exposure using a Levenson-type mask and a second exposure step of performing exposure using a half tone-type mask. When second minimum dimension is 1.3 time or more than the first minimum dimension, the exposure amount of the second exposure step is set to be equal to or smaller than the exposure amount of the first exposure step.
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