PHOTO-MASK INCLUDING A TRANSMITTANCE REGULATING PATTERN AND A METHOD FOR REGULATING THE TRANSMITTANCE OF THE PHOTO-MASK, CAPABLE OF IMPROVING THE UNIFORMITY OF CRITICAL DIMENSIONS BY REGULATING THE CRITICAL DIMENSIONS OF A PATTERN TO A DESIRED DIRECTION

摘要

PURPOSE: A photo-mask including a transmittance regulating pattern and a method for regulating the transmittance of the photo-mask are provided to effectively regulate the transmittance of the photo-mask without the damage of the photo-mask by inserting a trench shaped pattern to the edge part of a cell block.;CONSTITUTION: A plurality of cell patterns(410) is arranged in the cell region of a transparent substrate(400). A transmittance regulating pattern(420) is arranged around the cell region, in which the cell patterns are arranged, in order to regulate the transmittance of photo-mask. The transmittance regulating pattern is formed into a trench shape. The etched depth(d) of the transmittance regulating pattern is a depth which is capable of reversing the phase of transmitted light as much as 180 degrees.;COPYRIGHT KIPO 2011