METHOD FOR MANUFACTURING A TRANSITION METAL-DOPED NANOSTRUCTURED SILICON NITRIDE BASED COATING FILM USING AN ION GUN AND COATING FILM MANUFACTURED USING THE SAME

摘要

PURPOSE: A method for manufacturing a transition metal-doped nanostructured silicon nitride based coating film and a coating film manufactured using the same are provided to easily form a three-dimensional nanotructured coating film using an ion gun.;CONSTITUTION: A method for manufacturing a transition metal-doped nanostructured silicon nitride based coating film is as follows. Target particles are separated through a plating or sputtering method which uses an ion gun and are injected into a deposition chamber having plasma ions(S100). Transition metal ions are injected into the deposition chamber using an arc ion plating method(S120). A coating film composed of the target particles, the plasma ions, and transition metal is manufactured(S130).;COPYRIGHT KIPO 2012