Micro-mirror arrangement used for micro lithography, comprises micro-mirror having reflective surface applied on mirror substrate and anti-reflective coating applied on mirror substrate outside of reflective surface

摘要

A micro-mirror arrangement (1) comprises a micro-mirror (3) having a reflective surface applied on a mirror substrate (2) and an anti-reflective coating applied on mirror substrate outside of the reflective surface. A reflective coating is applied within the reflective surface. An absorbent layer made of non-metallic material is also provided, where the absorbent layer melts in UV range at wavelength of 193 nm. An independent claim is also included for a method for producing a coating micro-mirror array, which involves coating mirror substrate with anti-reflective coating.