Share compliance in the reticle stage and reticle exchange devices reticle

摘要

How to load the patterning device to the (1010) reticle stage of a lithographic system (RS) on high-speed exchange device that is configured to load the (1010) patterning device reticle stage of a lithographic system (RS) on the (RED), there is provided a system for manufacturing a semiconductor device lithography. The method includes the sharing of compliance between the six degrees of freedom between the reticle stage and RED (RS). Until the same plane and substantially in contact with the reticle stage and the patterning device (RS) is a (1010), RED is compatible with the three degrees of freedom only the first 3 free second reticle stage (RS) It is compatible with only degrees. [Selection Figure] Figure 10B