Method of manufacturing a nozzle plate manufacturing method of the droplet discharge head, method for manufacturing a droplet discharge device, the nozzle substrate, the droplet discharge head and liquid ejection apparatus

摘要

PROBLEM TO BE SOLVED: To provide the process of producing a nozzle substrate which can adjust the nozzle length properly, and can enhance liquid drop ejection performance by ensuring smooth flow of the liquid drop without stagnation.;SOLUTION: The process for producing a nozzle substrate comprises the step of forming an oxide film 101 having such a composition as the etching rate becomes slower toward the silicon base material 100 side, the step of coating the portion on the oxide film 101 excepting a part corresponding to a first nozzle hole 110a with resist 102, and forming the truncated conical first nozzle hole having a diameter being reduced toward the silicon base material 100 by wet etching the oxide film 101, the step of forming a substantially cylindrical second nozzle hole 110b by dry etching the silicon base material 100 from the reduced diameter side of the first nozzle hole 110a provided in the oxide film 101, the step of forming the second nozzle hole 110b through the silicon base material 100 by grinding it from the side opposite to side where the oxide film 101 is provided, and the step of forming the nozzle hole.;COPYRIGHT: (C)2008,JPO&INPIT