METHOD FOR PRODUCING ZINC OXIDE THIN FILM, ANTISTATIC THIN FILM PRODUCED BY THE SAME, ULTRAVIOLET RAY CUT THIN FILM, AND TRANSPARENT ELECTRODE THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a zinc oxide thin film that has an average transmittance of 80% or higher for visible light even in low-temperature deposition where the heating temperature of a substrate during deposition is 300°C or lower and the volume resistivity is low enough to be utilizable for an antistatic thin film, from a composition containing, as base, an organic zinc compound or its partial hydrolyzate.;SOLUTION: This method of manufacturing the zinc oxide thin film having an average transmittance of 80% or higher for visible radiation includes at least one operation of applying the following composition to a substrate surface under an inert gas atmosphere and then heating the obtained coating film. The composition is a solution obtained by dissolving the organic zinc compound or its partial hydrolyzate into a mixed solvent of an electron donative organic solvent and an organic solvent of a kind different from that of the electron donative organic solvent. The composition can further contain a group 3B element compound. An antistatic thin film consisting of the zinc oxide thin film obtained by the production method, an ultraviolet ray cut thin film, and a transparent electrode thin film are also provided.;COPYRIGHT: (C)2012,JPO&INPIT