Mask blank, method of manufacturing an exposure mask, method of manufacturing a reflection type mask, and method of manufacturing the imprint template

摘要

PROBLEM TO BE SOLVED: To provide a mask blank in which a fine pattern can be formed with high pattern accuracy in manufacturing an exposure mask or the like.;SOLUTION: The mask blank having a thin film 12, 13 to form a pattern on a substrate 11 is to be subjected to a dry etching process applicable to the method of producing an exposure mask, the method including patterning the thin film by dry etching using an etching gas substantially containing no oxygen through a resist pattern 14a to be formed on the thin film as a mask. The thin film has a protective layer containing oxygen in at least 60 atomic % in at least an upper layer part. The dry etching process is carried out by using a chlorine-based gas substantially containing no oxygen.;COPYRIGHT: (C)2008,JPO&INPIT