Plasma source assembly and analyzer with an inductively coupled plasma generator and the device, and a program to execute the inductively coupled plasma method and alignment methods and media

摘要

PROBLEM TO BE SOLVED: To obtain an inductively coupled plasma (ICP) alignment apparatus that dispenses with the movement of a bulky and heavy RF electronic circuit, can suppress RF radiation, and has small adjustment width for impedance matching.;SOLUTION: The ICP alignment apparatus comprises: a coil 10 for generating an ICP in a gas; a torch 20 passing at least partially through the coil 10; and an adjustment mechanism 80 for adjusting the position of the torch 20 to the coil 10 so that the arrangement of a torch axis 200 to a coil axis 100 changes. The adjustment mechanism 80 may adjust an angle and/or a distance between the axis of the coil 10 and the torch axis 200. The torch axis 200 may be held substantially parallel to the coil axis 100, while the adjustment mechanism adjusts a distance between the torch axis 200 and the coil axis 100. The coil 10 is preferably maintained substantially fixed in position with respect to a sampling aperture for sampling photons or ions originating from the inductively coupled plasma.;COPYRIGHT: (C)2007,JPO&INPIT