首页> 外国专利> PLASMA CONE FOR INDUCTIVELY COUPLED PLASMA MASS ANALYSER, INDUCTIVELY COUPLED PLASMA MASS ANALYSER, AND MANUFACTURING METHOD OF PLASMA CONE FOR INDUCTIVELY COUPLED PLASMA MASS ANALYSER

PLASMA CONE FOR INDUCTIVELY COUPLED PLASMA MASS ANALYSER, INDUCTIVELY COUPLED PLASMA MASS ANALYSER, AND MANUFACTURING METHOD OF PLASMA CONE FOR INDUCTIVELY COUPLED PLASMA MASS ANALYSER

机译:电感耦合等离子体质量分析仪的等离子锥,电感耦合等离子体质量分析仪以及等离子耦合电感质量分析仪的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a plasma cone capable of reducing impurity background and further improving durability without sacrificing sensitivity (ionic intensity), an inductively coupled plasma mass analyser including the plasma cone, and a manufacturing method of the plasma cone.SOLUTION: A sampling cone 14 and a skimmer cone 16 serving as plasma cone included in an interface part of the inductively coupled plasma mass analyser comprises: base materials 141, 161 formed of cupper, nickel and the like; and coating films 142, 162 formed on surfaces of the base materials 141, 161. The coating films 142, 162 are formed of platinum or platinum group metal other than platinum, or gold or an alloy thereof. The coating films 142, 162 are formed by an ion plating method or a plasma CVD method.SELECTED DRAWING: Figure 2
机译:解决的问题:提供一种能够在不牺牲灵敏度(离子强度)的情况下减少杂质本底并进一步提高耐用性的等离子体锥,包括该等离子体锥的电感耦合等离子体质量分析仪以及该等离子体锥的制造方法。包括在感应耦合等离子体质量分析仪的接口部分中的采样锥体14和作为等离子体锥体的撇渣器锥体16包括:由铜,镍等形成的基础材料141、161;以及由铜,镍等形成的基础材料141,161。镀膜142、162由铂或除铂以外的铂族金属,或金或其合金形成。镀膜142、162形成在基材141、161的表面上。涂膜142、162通过离子镀法或等离子体CVD法形成。图2

著录项

  • 公开/公告号JP2018146536A

    专利类型

  • 公开/公告日2018-09-20

    原文格式PDF

  • 申请/专利权人 SHIN ETSU HANDOTAI CO LTD;

    申请/专利号JP20170044820

  • 发明设计人 ARAKI KENJI;

    申请日2017-03-09

  • 分类号G01N27/62;H01J49/10;

  • 国家 JP

  • 入库时间 2022-08-21 13:14:06

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