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Silicon crystal growth crucible, crucible manufacturing method for silicon crystal growth, and silicon crystal growth method

机译:硅晶体生长坩埚,用于硅晶体生长的坩埚制造方法以及硅晶体生长方法

摘要

PROBLEM TO BE SOLVED: To provide a crucible for growing a silicon crystal, with which the precision of resistance control by a dopant of the silicon crystal is improved, the yield of the silicon crystal is enhanced, and the cost of raw materials is reduced, to provide a method for manufacturing the crucible, and to provide a method for growing the silicon crystal.;SOLUTION: The crucible C for growing a silicon crystal is constituted of a silicon-impregnated SiC layer C1 provided at the surface brought into contact with a silicon melt being stored, a melt repelling layer C2, a quartz glass layer C3, and a carbon layer C4. A method for producing the silicon-impregnated SiC layer C1 includes: an SiC powder molding process of molding a raw material SiC powder into a shape having a space storable of a silicon me a firing process of forming a porous SiC layer by firing the molded SiC powder molding; and a silicon impregnation process of forming the silicon-impregnated SiC layer by impregnating the porous SiC layer with molten silicon. The silicon impregnation process may be performed when a silicon raw material is heated and melted before the silicon crystal is pulled.;COPYRIGHT: (C)2011,JPO&INPIT
机译:要解决的问题:为了提供一种用于生长硅晶体的坩埚,通过该坩埚可以提高通过硅晶体的掺杂剂控制电阻的精度,提高硅晶体的产率,并降低原材料成本,提供一种用于制造坩埚的方法,并提供一种用于生长硅晶体的方法。解决方案:用于生长硅晶体的坩埚C由设置在与硅接触的表面上的浸有硅的SiC层C1构成。储存硅熔体,熔体排斥层C2,石英玻璃层C3和碳层C4。硅浸渍SiC层C1的制造方法包括:SiC粉末成型工序,其将原料SiC粉末成型为具有能够由硅熔液储存的空间的形状。通过烧制成型的SiC粉末成型体而形成多孔SiC层的烧制工序。硅的浸渗处理是通过在多孔SiC层中浸入熔融硅而形成硅浸入SiC层的方法。硅浸渍工艺可以在拉硅晶体之前加热和熔化硅原料时进行。;版权所有:(C)2011,JPO&INPIT

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