首页> 外国专利> Coating method of quarts crucible for silicon crystal growth and quarts crucible for silicon crystal growth

Coating method of quarts crucible for silicon crystal growth and quarts crucible for silicon crystal growth

机译:用于硅晶体生长的石英坩埚的涂覆方法和用于硅晶体生长的石英坩埚

摘要

A coating method for coating a crucible and a quartz crucible for growing a silicon crystal are provided. In the coating method, a bubble-free quartz layer which is 80 μm to 4 mm thick is formed on an inner surface of a crucible for growing a silicon crystal, and the surface of the bubble-free quartz layer is covered with alkaline earth hydroxide, following which heating is performed to a temperature at which the surface becomes devitrified. The surface may be covered by immersing the inner surface in a solution of the alkaline earth hydroxide. The heating may be performed before the crucible for growing silicon crystal is filled with a solid raw material to be melted.
机译:提供了用于涂覆坩埚的涂覆方法和用于生长硅晶体的石英坩埚。在涂覆方法中,在用于生长硅晶体的坩埚的内表面上形成80μm至4mm厚的无气泡石英层,并且该无气泡石英层的表面覆盖有碱土金属氢氧化物。之后,进行加热至表面失透的温度。可以通过将内表面浸入碱土金属氢氧化物溶液中来覆盖表面。加热可以在用于生长硅晶体的坩埚中填充有待熔化的固体原料之前进行。

著录项

  • 公开/公告号KR101325628B1

    专利类型

  • 公开/公告日2013-11-06

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20110071656

  • 申请日2011-07-19

  • 分类号C30B15/10;C03B20/00;C04B41/50;C30B29/06;

  • 国家 KR

  • 入库时间 2022-08-21 16:24:13

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