While the constituent null tungsten in order to etch the metal hard mask material in

摘要

Etching solution for metal hard mask. The particular etching solution dilution HF (the hydrogien fluoride) with has the blend of the silicon content outrider body. In addition as for the particular etching solution, it possesses also the corrosion inhibiter of the sahuakutanto medicine, carboxylic acid, and the copper. For example the particular etching solution, the metal hard mask material (while titanium) etching selectively, the tungsten, the copper, the oxide dielectric material, and carbon you control etching the oxide which is doped.