首页> 外国专利> ULTRAVIOLET RAYS EMITTING DIODE USING DISTRIBUTED BRAGG REFLECTOR AND METHOD FOR MANUFACTURING ULTRAVIOLET RAYS EMITTING DIODE USING DISTRIBUTED BRAGG REFLECTOR

ULTRAVIOLET RAYS EMITTING DIODE USING DISTRIBUTED BRAGG REFLECTOR AND METHOD FOR MANUFACTURING ULTRAVIOLET RAYS EMITTING DIODE USING DISTRIBUTED BRAGG REFLECTOR

机译:使用分布式布拉格反射器的紫外线发射二极管和使用分布式布拉格反射器的紫外线发射二极管的制造方法

摘要

PURPOSE: An ultraviolet light emitting diode which uses a dispersion Bragg reflection device and a manufacturing method thereof are provided to arrange a dispersion Bragg reflection layer by alternatively laminating aluminum nitride, silicon nitride, and silicon dioxide, thereby significantly improving optical extraction efficiency with a simple process. CONSTITUTION: An n-type semiconductor layer(20), an active layer(30), and a p-type semiconductor layer(40) are arranged on a substrate(10). A dispersion Bragg reflection layer(60) is arranged on the p-type semiconductor layer. The dispersion Bragg reflection layer is arranged by alternatively laminating aluminum-nitride or silicon nitride and silicon dioxide. A p-type electrode(70) is arranged by etching a part of the dispersion Bragg reflection layer. An n-type electrode(50) is arranged on the active layer.
机译:用途:提供一种使用色散布拉格反射装置的紫外线发光二极管及其制造方法,以通过交替层叠氮化铝,氮化硅和二氧化硅来布置色散布拉格反射层,从而以简单的方式显着提高光提取效率。处理。构成:n型半导体层(20),有源层(30)和p型半导体层(40)布置在基板(10)上。在p型半导体层上配置有色散布拉格反射层(60)。通过交替层叠氮化铝或氮化硅和二氧化硅来布置色散布拉格反射层。通过蚀刻分散布拉格反射层的一部分来布置p型电极(70)。在有源层上设置有n型电极(50)。

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