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Modeling and simulating the impact of imperfectly patterned via arrays on integrated circuits

机译:建模和模拟通过阵列进行不完美图案化对集成电路的影响

摘要

A technique models and simulates the impact of imperfectly patterned via arrays on integrated circuits through the use of hierarchical models and a hierarchical circuit simulator. Through the hierarchical modeling and simulation approach discussed here, far more accurate electrical simulation and verification of networks is enabled for; performance, yield, and reliability. The approach further enables simulation of the effects of via process variations on large-scale circuit response. In an implementation, each via in a layout or in a via array is modeled as having an independent size from other vias based upon calibrated process simulation. The electrical characteristics of independent vias and via arrays are modeled and compiled into a reusable hierarchical distributed resistance via model. Hierarchical simulation is performed using these hierarchical distributed via models and enables more accurate results than traditional approaches.
机译:一种技术通过使用分层模型和分层电路模拟器来建模和模拟通过阵列进行不完美图案化对集成电路的影响。通过此处讨论的分层建模和仿真方法,可以实现更加精确的网络电气仿真和验证。性能,良率和可靠性。该方法还使得能够仿真通孔工艺变化对大规模电路响应的影响。在一个实施方式中,基于校准的过程仿真,将布局或通孔阵列中的每个通孔建模为具有与其他通​​孔独立的尺寸。对独立通孔和通孔阵列的电特性进行建模,并将其编译为可重用的分层分布电阻通孔模型。使用通过模型分布的这些分层来执行分层仿真,并且与传统方法相比,可实现更准确的结果。

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