DEVICE WITH A BAFFLE FOR ANALYZING A PARTICLE AND A BY-PRODUCT GENERATED IN A VACUUM PROCESS, CAPABLE OF AVOIDING CONTAMINATION ON THE SURFACES OF AN INCIDENT WINDOW AND PROJECTING WINDOW

摘要

PURPOSE: A device with a baffle for analyzing a particle and a by-product generated in a vacuum process is provided to easily analyze by accurately measuring the intensity of beams caused by fraction and scattering, thereby improving the efficiency and the reliability of an analysis.;CONSTITUTION: A device with a baffle(80) for analyzing a particle and a by-product generated in a vacuum process comprises an exhaust pipe(11), a body(20), an incident window(30), a projecting window(40), an optical beam generator(50), and a detector(60). The particle and the by-product generated inside a vacuum chamber are exhausted to the inside of the exhaust pipe. The body coupled with the exhaust pipe forms a predetermined portion of the exhaust pipe and includes a first hollow unit and second hollow unit in which a predetermined portion of the circumference is hollow. Beams are incident into the inside of the incident window through the first hollow unit. Beams are refracted or scattered by the particle and by-product. The refracted or scattered beams are projected to the outside of the projecting window through the second hollow unit. The optical beam generator makes beams incident into the incident window. The detector detects the beams has incident into the inside of the exhaust pipe by the optical beam generator and projected.;COPYRIGHT KIPO 2013