METHOD FOR REPRINTING A PATTERN USING A TRANSFER DEVICE AND A METHOD FOR IRRADIATING AN ION BEAM CAPABLE OF UNIFORMLY REPRINTING THE PATTERN ON A CYLINDRICAL MOLD

摘要

PURPOSE: A method for reprinting a pattern using a transfer device and a method for irradiating an ion beam are provided to minimize a joint by reprinting the pattern on a cylindrical mold while moving a two-dimensional pattern mask.;CONSTITUTION: A two-dimensional pattern mask(240) is located on a transfer device(200). A cylindrical mold(100) for reprinting a pattern of a two-dimensional pattern mask is located in the lower center of the transfer device. A shadow mask(260) with a gap(265) is located on the upper side of the two-dimensional pattern mask. The pattern is reprinted on a part of the outer side of the cylindrical mold by exposing a part of the two-dimensional pattern mask using an optical source(280). The two-dimensional pattern mask is moved by equally performing the linear movement of the transfer device and the rotational movement of the cylindrical mold.;COPYRIGHT KIPO 2013