APPARATUS FOR ANALYZING SUBSTRATE CONTAMINATION AND A METHOD FOR ANALYZING WAFER CONTAMINATION USING SAME HAVING A PURGE GAS BARRIER

摘要

PURPOSE: An apparatus for analyzing substrate contamination and a method for analyzing wafer contamination using same are provided to effectively collect scanning solution by forming a purge gas barrier.;CONSTITUTION: A substrate transportation unit(200) transfers a substrate. A vapor resolving unit(300) performs an etching process for separating an oxide film from the substrate. A substrate scanning unit(500) collects contaminants existing on the surface of the substrate by using a scan nozzle. The substrate surface scan nozzle comprises a top cover, a body and a bottom cover. An analysis unit(600) analyzes the contaminants.;COPYRIGHT KIPO 2013