Antireflection layer with subwavelength grating nanostructure and fabricating method for the same

摘要

PURPOSE: An antireflection coating with a lattice microstructure which is less than an optical wavelength and a manufacturing method thereof are provided to prepare a microstructure which is less than an anti-reflective optical wavelength and a silicon oxide film on a surface of a silicon film, thereby reducing a surface reflectance. CONSTITUTION: A lattice microstructure(115) which is less than an anti-reflective optical wavelength is formed on an upper side of a silicon film(110). The lattice microstructure which is less than the anti-reflective optical wavelength is arranged in a cycle which is less than an optical wavelength. A surface of the silicon film is oxidized. A silicon oxide film(120) is formed on the upper side of the silicon film including the lattice microstructure which is less than the anti-reflective optical wavelength.