首页> 外国专利> MANUFACTURING METHOD FOR UV RAYS EMITTING DIODE AND UV RAYS EMITTING DIODE

MANUFACTURING METHOD FOR UV RAYS EMITTING DIODE AND UV RAYS EMITTING DIODE

机译:紫外线发射二极管和紫外线发射二极管的制造方法

摘要

The present invention relates to a manufacturing method for UV rays emitting diode and a UV rays emitting diode. According to the present invention, the manufacturing method for UV rays emitting diode is to manufacture a nitride semiconductor layer on which an N type clad layer, an active layer, and a P type clad layer are successively laminated and a nitride semiconductor based UV rays diode including a p-electrode and an n-electrode. When depositing the p-electrode on the P type clad layer, the p-electrode is deposited on 10-70% of the upper area of the P type clad layer. The shape of the p-electrode can be the shapes of mesh, punch, or one-dimensional grid. The UV rays emitting diode manufactured by the manufacturing method of the present invention is manufactured by a simple process while the area exposing the P-type clad layer is large, so that high efficient UV rays emitting diode can be provided by increasing the permeability of UV rays via parts on which p-electrode is not deposited.;COPYRIGHT KIPO 2015
机译:紫外线发光二极管的制造方法及紫外线发光二极管。根据本发明,紫外线发射二极管的制造方法是制造氮化物半导体层,在其上依次层叠有N型覆盖层,有源层和P型覆盖层,以及基于氮化物半导体的UV二极管包括p电极和n电极。当在P型覆盖层上沉积p电极时,p电极沉积在P型覆盖层的上部区域的10-70%上。 p电极的形状可以是网孔,冲头或一维网格的形状。通过本发明的制造方法制造的紫外线发射二极管通过简单的工艺制造,同时暴露出P型覆盖层的面积较大,从而可以通过增加紫外线的透过性来提供高效的紫外线发射二极管。通过未沉积p电极的零件发出光线。; COPYRIGHT KIPO 2015

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号