首页> 外国专利> Method for manufacturing vertical type light emitting diode, vertical type light emitting diode, method for manufacturing ultraviolet ray light emitting diode, and ultraviolet ray light emitting diode

Method for manufacturing vertical type light emitting diode, vertical type light emitting diode, method for manufacturing ultraviolet ray light emitting diode, and ultraviolet ray light emitting diode

机译:垂直型发光二极管的制造方法,垂直型发光二极管,紫外线发光二极管的制造方法以及紫外线发光二极管

摘要

A vertical type light emitting diode includes a nitride semiconductor having a p-n conjunction structure with a transparent material layer formed on a p type clad layer, the transparent material layer having a refractive index different from that of the p type clad layer and having a pattern structure of mesh, punched plate, or one-dimensional grid form, etc. A reflective metal electrode layer is formed on the transparent material layer as a p-electrode. A stereoscopic pattern is formed in the transparent material layer and the p-electrode deposited, and thereby forming the pattern in the p-electrode. Depositing the p-electrode on only 10 to 70% of the upper portion of the p type clad layer in an ultraviolet ray light emitting diode such that an area where the p type clad layer is exposed is wide increases the transmittance of ultraviolet rays through an area where the p-electrode is not deposited.
机译:垂直型发光二极管包括具有pn结结构的氮化物半导体,该pn结结构具有形成在p型覆盖层上的透明材料层,该透明​​材料层的折射率与p型覆盖层的折射率不同,并且具有如下图案结构:反射金属电极层形成在透明材料层上作为p电极。在透明材料层中形成立体图案并沉积p电极,从而在p电极中形成图案。在紫外线发光二极管中,仅在p型覆盖层上部的10%到70%处沉积p电极,以使p型覆盖层暴露的区域较宽,从而增加了紫外线透过膜的透射率。 p电极未沉积的区域。

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