method of detecting a specific defect, the detection system and a program of specific defect

摘要

PROBLEM TO BE SOLVED: To provide a method, system, and program for more reliably detecting specific defects formed on the surface of a wafer.;SOLUTION: A method for detecting specific defects comprises: a step (S101) of obtaining a light spot map which is the in-plane positional information of light spots detected corresponding to the positions of defects on the surface of a wafer exposed to light; a step (S102) of specifying the determination target region where the specific defects is expected to be formed and the reference region which is a predetermined region other than the determination target region and calculating the ratio of the light spot density of the determination target region to the light spot density of the reference region; and a step (S103) of determining whether the specified defects are present or not based on the calculated ratio value.;COPYRIGHT: (C)2013,JPO&INPIT