how to fix methods, and the roughness of the patterned resist feature that reduces the surface roughness of the resist feature

摘要

Solutions The method of decreasing the surface roughness of rejisutohuichiya which is provided on the baseplate has the stage which forms the plasma sheath and the plasma to which inside includes the ion. In order the one part which opposes to the inside baseplate of boundary with the plasma and the plasma sheath, not to become parallel to the plane surface which the baseplate demarcates, form of boundary is corrected making use of the plasma sheath correction section. At the time of 1st irradiating, the electromagnetic wave which has the wave length of desire is irradiated to rejisutohuichiya. And, over the angular range of given, exceeding the boundary which has the form after the correcting, directing to rejisutohuichiya, the ion it accelerates. Selective figure Figure 7